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Development of a multidimensional hydrodynamic-radiative model of tin plasmas for the optimisation of EUV sources at 13.5 nm

Institut national de la recherche scientifique · Centre énergie matériaux télécommunications · Canada

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Extreme ultraviolet (EUV) emission at 13.5 nm from tin plasma is essential for next-generation nanolithography in the semiconductor industry, but optimizing its conversion efficiency (CE) is challenging. Understanding how laser parameters, such as wavelength, pulse duration, and time structure, influence plasma dynamics and EUV yield is crucial for designing more efficient, compact, and robust EUV sources. This project aims to develop a 2D hydrodynamic-radiative model to simulate laser-tin interactions, taking into account laser absorption, plasma expansion, and EUV emission processes.

This model will use experimental parameters as input and will be validated using yield and spectroscopic data.

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Development of a multidimensional hydrodynamic-radiative model of tin plasmas for the optimisation of EUV sources at 13.5 nm — Institut national de la recherche scientifique